The fresh industrial research report Global Plasma Etch System Market Growth 2019-2024 published and promoted by Fior Markets studies industry trends, market gains, Market development aspects, growth speed, and industry situation during the forecast period (2019-2024). The report investigates the market measures, figures, and provincial dimensions. Chapter-wise segregation followed thoughtfully by user senses and businesses details. The latest trends in global and regional market areas along with production, capacity, competitor analysis, profit etc. of the market are further highlighted in the report.
This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
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North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.
Applied Materials, Inc. ranks the first in terms of revenue share in Global market of Plasma Etch System, occupies 24.12% of market share in 2016; While, Lam Research, with a market share of 22.89%, comes the second; Tokyo Electron Limited, with a market share of 17.36% in 2016, comes the third. All the other manufacturers which are not included in the report together consist of approximately 27.02% of the global market in 2016.
According to this study, over the next five years the Plasma Etch System market will register a 12.9% CAGR in terms of revenue, the global market size will reach US$ 8110 million by 2024, from US$ 3910 million in 2019. In particular, this report presents the global market share (sales and revenue) of key companies in Plasma Etch System business, shared in Chapter 3.
This report presents a comprehensive overview, market shares, and growth opportunities of Plasma Etch System market by product type, application, key manufacturers and key regions and countries.
The players from the Plasma Etch System market involved in the report are Oxford Instruments, ULVAC, Lam Research, AMEC, PlasmaTherm, SAMCO Inc., Applied Materials, Inc., Sentech, SPTS Technologies (an Orbotech Company), GigaLane, CORIAL, Trion Technology, NAURA, Plasma Etch, Inc., Tokyo Electron Limited
The global market report predicts the scope of the market on the basis of key areas like Americas (United States, Canada, Mexico, Brazil), APAC (China, Japan, Korea, Southeast Asia, India, Australia), Europe (Germany, France, UK, Italy, Russia, Spain), Middle East & Africa (Egypt, South Africa, Israel, Turkey, GCC Countries)
The report has outlined a definition, type, macroeconomic policies, sales channel, and industry characteristics. In addition, mechanical advancements, key improvements, inventory network patterns, driving and controlling players, and future methodologies are also highlighted in the report. Side by side, the report also exhaustively delivers information about mergers, acquisitions, joint ventures, and all the other important activities appeared in the market during the current and past few years. Finally, it provides the whole feasibility of upcoming projects and finally adds the research conclusion. In the end, this report shows the present state and visualizes what’s to come.
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